SAFETY AND EMERGENCY
All users of the MTTC Cleanroom are expected to pass a written safety exam before they are granted full access to the facility. This exam is based upon materials presented in the Cleanroom safety tutorial. Emergency procedures are also covered in the safety tutorial and are posted throughout the cleanroom.

PROCESS LIST
The UNM MTTC Cleanroom supports several microfabrication and MEMS processes, including photolithography steps (resist spinning, softbake (hotplate/Blue M oven), contact exposure, bath developing, spin rinse drying, hardbake), wet etch (dedicated KOH, SC1, SC2 and HF baths), solvent /acid cleaning, RIE plasma etch (single wafer), Deep Reactive Ion Etching (DRIE, Alcatel model AMS-100-SDE), parylene coating, diffusion processing (oxidation wet and dry, N-Dope and drive, P-Dope and drive, LPCVD silicon nitride deposition, LPCVD polysilicon deposition, LPCVD oxide deposition), vacuum evaporator, five-source reactive-gas sputter system, E-Beam cure, forming gas diffusion, CO2 critical dryer, metrology (film thickness measurement, four point probe, interferometer) and SEM.

Users of the cleanroom are expected to have their process steps checked by cleanroom staff to make sure the chemicals and gasses are compatible with those supported by the cleanroom, and that procedures are within the safety guidelines of the cleanroom.

USERS RATE STRUCTURE
For FY-10 (effective 1 Oct 2009), UNM-based researchers (academic), and federal laboratory and commercial customers (non-academic), are charged for use of the MTTC Cleanroom on a monthly billing cycle per the following schedule:

• There is no fee for use of the cleanroom for teaching lab sessions directly related to university, community college and high school courses.
• Out-of-state trainees will be charged a lab fee of $100 per course or workshop.
• Basic Lab fee: $33.00/hour academic users; $66.00/hour non-academic users, capped at $990/month academic users; $1,980/month non-academic users. The basic lab, primarily, covers photolithography and metrology tools. There are additional hourly fees for the DRIE, Parylene and SEM tools (see below).
• Staff support fee: $37.50/hr academic users (no cap); $75.00/hr non-academic users (no cap).
• Annual user admin fee: Each faculty member or organization that uses the cleanroom is charged an admin fee each fiscal year (1 Oct) at $150/yr for academic users and $300/yr for non-academic users. This is not a head-count fee. This is not a pro-rated fee.
• Equipment fee: Selected utility- and maintenance-intensive equipment will have an additional hourly charge associated with it, above the Basic Lab Fee. Specifically,
  

  Equipment-specific fee structure
  Item	Academic Rate	Non-Academic Rate	Notes
  DRIE	$52.50/hour	$105/hour	Requires user certification; no cap
  Parylene Coater	$20/hour	$40/hour	Requires user certification; no cap
  SEM	$20/hour	$40/hour	Requires user certification; no cap
  Five-Source Sputtering Tool	$15/hour	$30/hour	Requires user certification; no cap
  6-Stack Furnace * Atmospheric, without specialty gasses * Atmospheric, with specialty gasses * LPCVD	$15/hour $20/hour $25/hour	$30/hour $40/hour $50/hour	Requires user certification; no cap

• Each company is limited to eight (8) users, at any given time.
• "Junior Faculty" members (pre-tenure) will receive a 50% discount off of the Academic Rate, for their first three years at UNM.
• "Junior Faculty" will pay no fees when using students in the cleanroom who are paid off of internal UNM-provided start-up funds, for their first six years or to tenure (whichever comes first).
• Users will pay for chemicals and supplies that are not on the standard MTTC supply list, or exceed the typical consumption rate for normal MTTC cleanroom use. Users are expected to provide proper targets for the evaporation tools and the sputtering system.
• Commercial users of the cleanroom are expected to sign a Facilities Use Agreement (FUA) prior to use of the facility. A PDF of this Agreement is available for consideration.

USERS GUIDE AND SIGN UP
A Users Guide for the MTTC Cleanroom is available from the MTTC Cleanroom staff.

Sign-up sheets for the scheduling of tool use are posted in the MTTC Cleanroom facilities. Users can schedule up to two months in advance on the rolling calendar.

Priority of scheduling is:

(1) training for student labs related to regular university and community college classes,
(2) university research and development, and
(3) commercial sector use (40% of total tool-hours capacity, minimum). Computerized (internet) signup sheets, to replace current paper sheets, are expected in the future.

USERS LIST
The MTTC Cleanroom users have included: UNM students, CNMCC students, UNM faculty and student researchers, regional High School faculty members, Advent Solar, AgilOptics, Emcore, Defiant Technologies, Gratings Inc., HT Micro Analytical, InterCrossIP, Incitor, K-Tech, LANL, Life Bioscience, Mechanical Solutions, MEMX, MicroNano Platforms, Optomec, Qynergy, Radiant Technologies, Surfect, and SNL.

CLASSES
The MTTC cleanroom supports the UNM ECE-574 Microelectronics Processing course (Prof. Hersee), the UNM ECE-595 MEMS course (Prof. Chen), UNM ME-561 bioMEMS course (Prof. Lesesman), and the UNM ChNE-586 Statistics for Design of Experiments in Semiconductor Manufacturing, as well as MEMS courses at CNMCC. Periodically, the MTTC cleanroom supports week-long (45 hrs) short courses in MEMS, for high school faculty and community college faculty (for information, please contact mep@unm.edu). A MEMS device, such as a pressure sensor, is produced during these short courses.

Full courses, short courses and labs hosted by the MTTC Cleanroom include,

Spring 2006

• UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET. (15 students)

Summer 2006

• The UNM MTTC cleanroom hosted regional High School faculty members (6) for a hands-on MEMS training session, to create a MEMS pressure sensor, from June 5 through June 9, 2006.

Fall 2006

• CNM MEMS-101 Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers. (7 NM students)

Spring 2007

• CNM MEMS-101 Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers. (12 CNM students)
• UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET. (20 students)
• UNM ECE-595 MEMS, Transducers, Devices and Technology (Prof. Chen); created pressure sensor, and drug delivery probe prototype. (9 students)

Summer 2007

• The MTTC Cleanroom hosted a week-long MEMS workshop for local high school faculty members, wherein they created a wafer of pressure sensors (4 faculty from Bernalillo High School, June 2007).
• CNM MEMS-101 Intro to MEMS course (Instructor: Fabian Lopez); created art wafers, practiced cleanroom protocols and safety, learned photolithography, BOE etch, and piranha strip techniques. (9 students)
• CNM MEMS-220 MEMS Fabrication Techniques course (Instructor: Fabian Lopez); created pressure sensor arrays, practiced cleanroom protocols and safety, learned photolithography, plasma dry-etch, metallization for the "lift-off" process, KOH bulk etch of silicon, electrical testing, and piranha strip techniques. (7 students)

Fall 2007

• UNM ME-461E/561E, ECE-519 and NSMS-519 ST Theory, Fabrication, and Characterization of Nano/Microelectromechanical Systems (NEMS/MEMS) course (Prof. Leseman); created MEMS pressure sensors and MEMS actuators. (27 students)
• The MTTC Cleanroom hosted a week-long MEMS workshop for high school faculty members from Santa Fe and Vermont, and university faculty members from Iowa, Texas and Mexico, wherein they created a wafer of pressure sensors (12-16 November 2007)
• CNM MEMS-101 (Sec. 101) Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers. (9 CNM students)
• CNM MEMS-101 (Sec. 102) Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers. (5 CNM students)
• CNM MEMS-101 (Sec. 103) Intro to MEMS course (Instructor: Matthias Pleil), practiced cleanroom safety and wafer fabrication. (9 CNM students)
• CNM MT-2097 (Sec. 102) offered as substitute for MEMS-220; created pressure sensor arrays, practiced cleanroom protocols and safety, learned photolithography, plasma dry-etch, metallization for the "lift-off" process, KOH bulk etch of silicon, electrical testing, and piranha strip techniques. (5 students)

Spring 2008

• UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET. (16 students)
• CNM SMT-2001 sec 101 Semiconductor Fabrication course (Instructor: Fabian Lopez), fabricated functional NMOS transistors, BOE etches of SiO2-coated wafers, Aluminium deposition and etching of wafers, electrical testing. (5 CNM students)
• Southwest Indian Polytechnic Institute (SIPI), Manufacturing Technology course (Instructors: Nader Vadiee and Manuel Maese); Native American students created "art" wafer during one 4 hour lab session at MTTC cleanroom. (8 students)
• CNM Introduction to MEMS dual enrollment high school students participated in cleanroom safety and fabrication activities (14 students, Instructors: Olga Vazquez, Albuquerque High School)

Summer 2008

• The MTTC Cleanroom hosted a week-long SCME/MEMS workshop for 2 UT-Brownsville students, and 4 APS high school faculty members, wherein they created a wafer of pressure sensors (7-11 July 2008)
• The SCME co-sponsored Introductory MEMS activities at the MTTC for Native American Students participating in the Southwestern Indian Polytechnic Institute ROPE program as well as their ATEC summer program for faculty from tribal colleges. (14 July to 11 August 08; 5 faculty, 3 students; made Art Wafers)
• CNM Introduction to MEMS (MEMS1001) students participated in cleanroom safety and wafer processing activities. (11 students)
• CNM MEMS Manufacturing Technology students (MEMS2015/2092) students utilized the MTTC cleanroom learning process characterization and advanced fabrication skills. (4 students)
• Workshop and meetings held for PED Online Nanoscience Course Development grant contributors, Principal Investigator, Dr. Matthias Pleill

Fall 2008

• The MTTC was host to a Southwest Center for Microsystems Education (SCME) week-long MEMS fabrication workshop held November 10 through the 14th, 2008. Faculty from Austin Community College (TX), North Dakota State College of Science (ND) and Northwest Vista College (San Antonio, TX) participated with 7 Northwest Vista College students from their two-year Nanotechnology Technician program. The students and faculty, working side-by-side, each fabricated their own wafer and successfully applied surface and bulk micromachining fabrication principles, to make a pressure sensor.
• The SCME sponsored an Introduction to MEMS workshop for 9 New Mexico middle and high school teachers at the MTTC auditorium. Teachers were also given a tour of the cleanroom facilities. (Instructor: Dr. Matthias Pleil; 15 Nov 2008)
• CNM Introduction to MEMS (MEMS1001) students participated in Cleanroom Safety and Wafer processing activities. (14 students, Instructor Dr. Matthias Pleil)
• CNM Introduction to MEMS (MEMS1001) high school dual enrollment students participated in Cleanroom Safety and Wafer processing activities. (14 students, instructor high school teacher Olga Vazquez)
• UNM ME-461E/561E, ECE-519 and NSMS-519 ST Theory, Fabrication, and Characterization of Nano/Microelectromechanical Systems (NEMS/MEMS) course (Prof. Leseman); created MEMS pressure sensors and MEMS actuators. (27 students)
• CNM Statistical Controls (MT 2005) students participated in Cleanroom Safety and Wafer processing activities. Students took data from a photoresist coating process developed histograms, determined that the system was stable and developed control charts for this process. (15 students; CNM instructor Fabian Lopez). Approximately 25hrs of cleanroom time)

Spring 2009

• SCME sponsored Introduction to Microsystems Workshop for teachers utilizing the MTTC Auditorium and clean room facility tour. (8 participants, Instructors: Fabian Lopez and Dr. Matthias Pleil; 01/24/2009)
• SCME sponsored Microsystems advanced topic workshop (7 NM high school teachers, 5/30/2009)
• CNM Introduction to MEMS (MEMS1001-21) high school dual enrollment students participated in cleanroom tour, safety and wafer processing activities. (16 students from Socorro High School, Instructor: Dr. Matthias Pleil)
• CNM Introduction to MEMS (MEMS1001-101) participated in cleanroom tour, safety and wafer processing activities. This course is part online and part in class on Saturdays for hands-on activities (13 students, Instructor: Dr. Matthias Pleil)
• CNM Introduction to MEMS (MEMS1001-901) high school dual enrollment students will participate in cleanroom safety and wafer processing activities. (9 students, Teacher: Albuquerque High School Teacher Olga Vazquez)
• CNM MEMS Manufacturing Process (MEMS2001-101) advanced fabrication methods, students fabricate a micro pressure sensor utilizing the MTTC cleanroom for all laboratory work. Approximately 45hrs of cleanroom time. (7 students, Instructor: Fabian Lopez)
• UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET. (14 students)
• The MTTC Cleanroom hosted a one-day MEMS workshop for 12 students from Bernalillo High School (Instructors were: Abe Gurule and Evelyn Eppinger - BHS; Fabian Lopez - CNM (SCME Outreach), Harold Madsen - UNM). The students made an "art wafer" (9 March 2009)

Summer 2009

• CNM Statistical Controls (MT 2005) students participated in Cleanroom Safety and Wafer processing activities. Students took data from a photoresist coating process developed histograms, determined that the system was stable and developed control charts for this process. (3 students, instructor CNM teacher Fabian Lopez) Approximately 25hrs of cleanroom time.
• CNM MEMS Manufacturing Lab (MEMS 2092) student participated in Cleanroom Safety and Wafer processing activities. Student learned and review tool set qualifications. Student successfully completed both written and oral exams on clean room tool sets. (1 student, instructor CNM teacher Fabian Lopez) Approximately 45hrs of cleanroom time.
• CNM SemiConductor Manufacturing Lab (SMT 2092) students participated in Cleanroom Safety and Wafer processing activities. Students fabricated a functioning N-channel enhancement mode MOSFET. (3 students, instructor CNM teacher Fabian Lopez) Approximately 55hrs of cleanroom time.

Fall 2009

• The Southwest Center for Microsystems Education (SCME) sponsored a MEMS fabrication workshop, held October 13 through the 17th, 2008. Three faculty, one director, and one technician, from Indiana University of Pennsylvania, Bowling Green State University, Penn State University, Danville Community College, and Chippewa Valley Technical College, fabricated a pressure sensor.

Tours hosted by the MTTC Cleanroom include:

• Albuquerque High School (CNM Instructor Fabian Lopez; AHS Instructor Olga Vasquez; 28 HS students)
• Santa Fe Indian School (CNM Instructor Fabian Lopez; SFIS Instructor Smokey Trujillo; 35 HS students)
• CNM ENGR-101 (CNM Instructor Dr. Matt Pleil; 20 CC students)
• Santa Fe Indian School (SFIS Instructor Smokey Trujillo; 11 HS students, 4/30/08, watched wafer processing)
• SIPI (12 college students, and Dr. N. Vadiee, 3/27/09)

REFERENCEs

• Small Times (May/June 2007): “Community Colleges are Critical”, by Staff, Vol. 7, No. 3, pg. 28.

SUPPORT

The UNM MTTC Cleanroom Project gratefully acknowledges support from the,

• State of New Mexico, for capital and operating funds,
• University of New Mexico, for capital funds,
• U.S. Department of Commerce, Economic Development Administration (EDA), for capital funds,
• National Science Foundation, for MRI funds (ECS-0521461),
• Next Generation Economy (NGE) industry cluster, for equipment donations,
• Intel Corporation, for equipment donations and operating funds,
• Philips Semiconductor, for equipment donations,
• AT&T, for equipment donations.