GENERAL INFORMATION
The UNM MTTC Cleanroom opened with Phase I operations during Fall 2001. Since then, the cleanroom has supported several UNM courses, including ECE-474/574 Microelectronics Processing, ECE-495 MEMS, and ChNE-586 Statistical Design of Experiments for Semiconductor Manufacturing. In addition, the Cleanroom has supported several courses at regional community colleges, including Semiconductor Manufacturing Technologies (SMT) and Microelectromechanial Systems (MEMS) courses offered by the Central New Mexico Community College (formerly, Albuquerque TVI). The MTTC Cleanroom is also a training venue for Manufacturing Technologies (MT) labs offered by the Southwest Indian Polytechnical Institute (SIPI). The cleanroom also supports basic university research, and prototype development by small companies. The photolithography bay is Class-100. The MTTC Cleanroom is a university Service Center, thus there is a fee for use (see Rate Structure, below). Phase II construction, completed 2007, added a bay/chase space, and NSF MRI-provided DRIE and Parylene coater tools. Phase III construction, underway for 2008, will add another bay/chase space, and a six-stack furnace.

TThe MTTC Cleanroom has air handling units, DI/RO water, nitrogen, two scrubbers, acid waste neutralization and a backup generator, as equipment support infrastructure.

SAFETY AND EMERGENCY
All users of the MTTC Cleanroom are expected to pass a written safety exam before they are granted full access to the facility. This exam is based upon materials presented in the Cleanroom safety tutorial. Emergency procedures are also covered in the safety tutorial and are posted throughout the cleanroom.

PROCESS LIST
The UNM MTTC Cleanroom can presently support a of number of processes, including photolithography steps (wet etch, bake, solvent cleaning, resist spinning, resist strip, rinse, stepping, alignment, plasma etch (single wafer), metrology, SEM, etc.), Deep Reactive Ion Etching (DRIE, Alcatel model AMS-100-SDE), parylene coating, and metal evaporation.

Users of the cleanroom are expected to have their process steps checked by cleanroom staff to make sure the chemicals and gasses are compatible with those supported by the cleanroom, and that procedures are within the safety guidelines of the cleanroom.

RATE STRUCTURE
For FY-08 (effective 1 Sep 2007), UNM-based researchers (academic), and federal laboratory and commercial customers (non-academic), are charged for use of the MTTC Cleanroom on a monthly billing cycle per the following schedule. There is no fee for use of the cleanroom for labs directly related to university and community college courses.

• Basic Lab fee: $32.00/hour academic users; $64.00/hour non-academic users, capped at $960/month academic users; $1,920/month non-academic users. The basic lab, primarily, covers photolithography and metrology tools. There are additional hourly fees for the DRIE, Parylene and SEM tools (see below).
• Staff support fee: $37.50/hr academic users (no cap); $75.00/hr non-academic users (no cap).
• Annual user admin fee: Each individual user of the cleanroom is charged an admin fee each fiscal year at $100/yr for academic users and $200/yr for non-academic users.
• Equipment fee: Selected utility-intensive equipment will have an additional hourly charge associated with it, above the Basic Lab Fee. Specifically,
  

  Equipment-specific fee structure
  Item	Academic Rate	Non-Academic Rate	Notes
  DRIE	$50/hour	$100/hour	Requires user certification; no cap
  Parylene Coater	$20/hour	$40/hour	Requires user certification; no cap
  SEM	$20/hour	$40/hour	Requires user certification; no cap

• Each company is limited to eight (8) users, at any given time.
• "Junior Faculty" members, defined as faculty members who have been at UNM for less than two years, will receive a 50% discount off of the Academic Rate.
• Users will pay for chemicals and supplies that are not on the standard MTTC supply list, or exceed the typical consumption rate for normal MTTC cleanroom use.
• Users of the cleanroom are expected to sign a Facilities Use Agreement (FUA) prior to use of the facility. A PDF of this Agreement is available for consideration.

USERS GUIDE AND SIGN UP
A Users Guide for the MTTC Cleanroom is available from the MTTC Cleanroom staff.

Sign-up sheets for the scheduling of tool use are posted in the MTTC Cleanroom facilities. Users can schedule up to two months in advance on the rolling calendar.

Priority of scheduling is:

(1) training for student labs related to regular university and community college classes,
(2) university research and development, and
(3) commercial sector use (40% of total tool-hours capacity, minimum). Computerized (internet) signup sheets, to replace current paper sheets, are expected in the future.

USERS LIST
The MTTC Cleanroom users have included: UNM students, CNMCC students, UNM faculty and student researchers, regional High School faculty members, Advent Solar, AgilOptics, Emcore, HT Micro Analytical, K-Tech, LANL, MEMX, Optomec, Qynergy, Radiant Technologies, Surfect, and SNL.

CLASSES
The MTTC cleanroom supports the UNM ECE-574 Microelectronics Processing course (Prof. Hersee), the UNM ECE-595 MEMS course (Prof. Chen), UNM ME-561 bioMEMS course (Prof. Lesesman), and the UNM ChNE-586 Statistics for Design of Experiments in Semiconductor Manufacturing, as well as MEMS courses at CNMCC. Periodically, the MTTC cleanroom supports week-long (45 hrs) short courses in MEMS, for high school faculty and community college faculty (for information, please contact mep@unm.edu). A MEMS device, such as a pressure sensor, is produced during these short courses.

Courses hosted by the MTTC Cleanroom include,

Spring 2006

• UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET (15 students)

Summer 2006

• The UNM MTTC cleanroom hosted regional High School faculty members (6) for a hands-on MEMS training session, to create a MEMS pressure sensor, from June 5 through June 9, 2006.

Fall 2006

• CNM MEMS-101 Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers (7 NM students)

Spring 2007

• CNM MEMS-101 Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers (12 CNM students)
• UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET (20 students)
• UNM ECE-595 MEMS, Transducers, Devices and Technology (Prof. Chen); created pressure sensor, and drug delivery probe prototype (9 students)

Summer 2007

• The MTTC Cleanroom hosted a week-long MEMS workshop for local high school faculty members, wherein they created a wafer of pressure sensors (4 faculty from Bernalillo High School, June 2007).
• CNM MEMS-101 Intro to MEMS course (Instructor: Fabian Lopez); created art wafers, practiced cleanroom protocols and safety, learned photolithography, BOE etch, and piranha strip techniques. (9 students)
• CNM MEMS-220 MEMS Fabrication Techniques course (Instructor: Fabian Lopez); created pressure sensor arrays, practiced cleanroom protocols and safety, learned photolithography, plasma dry-etch, metalization for the "lift-off" process, KOH bulk etch of silicon, electrical testing, and piranha strip techniques. (7 students)

Fall 2007

• UNM ME-461E/561E, ECE-519 and NSMS-519 ST Theory, Fabrication, and Characterization of Nano/Microelectromechanical Systems (NEMS/MEMS) course (Prof. Leseman); created MEMS pressure sensors and MEMS actuators (27 students)
• The MTTC Cleanroom hosted a week-long MEMS workshop for high school faculty members from Santa Fe and Vermont, and university faculty members from Iowa, Texas and Mexico, wherein they created a wafer of pressure sensors (12-16 November 2007)
• CNM MEMS-101 (Sec. 101) Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers (9 CNM students)
• CNM MEMS-101 (Sec. 102) Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers (5 CNM students)
• CNM MT-2097 (Sec. 102) offered as substitute for MEMS-220; created pressure sensor arrays, practiced cleanroom protocols and safety, learned photolithography, plasma dry-etch, metalization for the "lift-off" process, KOH bulk etch of silicon, electrical testing, and piranha strip techniques. (5 students)

Spring 2008

• UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET (16 students)
• CNM SMT-2001 sec 101 Semiconductor Fabrication course (Instructor: Fabian Lopez), fabricated functional NMOS transistors, BOE etches of SiO2-coated wafers, Aluminium deposition and etching of wafers, electrical testing (5 CNM students)
• Southwest Indian Polytechnical Institute (SIPI), Manufacturing Technology course (Instructors: Nader Vadiee and Manuel Maese); Native American students created "art" wafer during one 4 hour lab session at MTTC cleanroom (8 students)

Tours hosted by the MTTC Cleanroom include:

• Albuquerque High School (CNM Instructor Fabian Lopez; AHS Instructor Olga Vasquez; 28 HS students)
• Santa Fe Indian School (CNM Instructor Fabian Lopez; SFIS Instructor Smokey Trujillo; 35 HS students)
• CNM ENGR-101 (CNM Instructor Dr. Matt Pleil; 20 CC students)
• Santa Fe Indian School (SFIS Instructor Smokey Trujillo; 11 HS students, 4/30/08, watched wafer processing)

REFERENCEs

• Small Times (May/June 2007): “Community Colleges are Critical”, by Staff, Vol. 7, No. 3, pg. 28.