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The UNM MTTC Cleanroom opened
with Phase I operations during Fall 2001. Since then,
the cleanroom has supported several UNM courses, including
ECE-474/574 Microelectronics Processing, ECE-495 MEMS,
and ChNE-586 Statistical Design of Experiments for Semiconductor
Manufacturing. In addition, the Cleanroom has supported
several courses at regional community colleges, including
Semiconductor Manufacturing Technologies (SMT) and Microelectromechanial
Systems (MEMS) courses offered by the Central New Mexico
Community College (formerly, Albuquerque TVI). The MTTC
Cleanroom is also a training venue for Manufacturing
Technologies (MT) labs offered by the Southwest Indian
Polytechnical Institute (SIPI). The cleanroom also supports
basic university research, and prototype development
by small companies. The photolithography bay is Class-100.
The MTTC Cleanroom is a university Service Center, thus
there is a fee for use (see Rate Structure, below).
Phase II construction, completed 2007, added a bay/chase
space, and NSF MRI-provided DRIE and Parylene coater
tools. Phase III construction, underway for 2008, will
add another bay/chase space, and a six-stack furnace.
TThe
MTTC Cleanroom has air handling units, DI/RO water,
nitrogen, two scrubbers, acid waste neutralization and
a backup generator, as equipment support infrastructure.
All users of the MTTC Cleanroom
are expected to pass a written safety exam before they
are granted full access to the facility. This exam is
based upon materials presented in the Cleanroom safety
tutorial. Emergency procedures are also covered in the
safety tutorial and are posted throughout the cleanroom.
The UNM MTTC Cleanroom can presently
support a of number of processes, including photolithography
steps (wet etch, bake, solvent cleaning, resist spinning,
resist strip, rinse, stepping, alignment, plasma etch
(single wafer), metrology, SEM, etc.), Deep Reactive
Ion Etching (DRIE, Alcatel model AMS-100-SDE), parylene
coating, and metal evaporation.
Users of the cleanroom are expected
to have their process steps checked by cleanroom staff
to make sure the chemicals and gasses are compatible
with those supported by the cleanroom, and that procedures
are within the safety guidelines of the cleanroom.
For FY-08 (effective 1 Sep 2007),
UNM-based researchers (academic), and federal laboratory
and commercial customers (non-academic), are charged
for use of the MTTC Cleanroom on a monthly billing cycle
per the following schedule. There is no fee for use
of the cleanroom for labs directly related to university
and community college courses.
- Basic Lab
fee: $32.00/hour academic users; $64.00/hour non-academic
users, capped at $960/month academic users; $1,920/month
non-academic users. The basic lab, primarily,
covers photolithography and metrology tools. There
are additional hourly fees for the DRIE, Parylene
and SEM tools (see below).
- Staff support fee: $37.50/hr academic
users (no cap); $75.00/hr non-academic users (no cap).
- Annual user admin fee: Each individual
user of the cleanroom is charged an admin fee each
fiscal year at $100/yr for academic users and $200/yr
for non-academic users.
- Equipment fee: Selected utility-intensive
equipment will have an additional hourly charge associated
with it, above the Basic Lab Fee. Specifically,
| Equipment-specific
fee structure |
| Item |
Academic Rate |
Non-Academic Rate |
Notes |
| DRIE |
$50/hour |
$100/hour |
Requires user certification; no cap |
| Parylene Coater |
$20/hour |
$40/hour |
Requires user certification; no cap |
| SEM |
$20/hour |
$40/hour |
Requires user certification;
no cap |
- Each company is limited to eight
(8) users, at any given time.
- "Junior Faculty" members,
defined as faculty members who have been at UNM for
less than two years, will receive a 50% discount off
of the Academic Rate.
- Users will pay for chemicals and
supplies that are not on the standard MTTC supply
list, or exceed the typical consumption rate for normal
MTTC cleanroom use.
- Users of the cleanroom are expected
to sign a Facilities Use Agreement (FUA) prior to
use of the facility. A PDF of this Agreement is available
for consideration.
A Users Guide for the MTTC Cleanroom
is available from the MTTC Cleanroom staff.
Sign-up sheets for the scheduling
of tool use are posted in the MTTC Cleanroom facilities.
Users can schedule up to two months in advance on the
rolling calendar.
Priority of scheduling is:
(1) training for student labs related
to regular university and community college classes,
(2) university research and development,
and
(3) commercial sector use (40% of total
tool-hours capacity, minimum). Computerized (internet)
signup sheets, to replace current paper sheets, are
expected in the future.
The MTTC Cleanroom users have
included: UNM students, CNMCC students, UNM faculty
and student researchers, regional High School faculty
members, Advent Solar, AgilOptics, Emcore, HT Micro
Analytical, K-Tech, LANL, MEMX, Optomec, Qynergy, Radiant
Technologies, Surfect, and SNL.
The MTTC cleanroom supports the
UNM ECE-574 Microelectronics Processing course (Prof.
Hersee), the UNM ECE-595 MEMS course (Prof. Chen), UNM
ME-561 bioMEMS course (Prof. Lesesman), and the UNM
ChNE-586 Statistics for Design of Experiments in Semiconductor
Manufacturing, as well as MEMS courses at CNMCC. Periodically,
the MTTC cleanroom supports week-long (45 hrs) short
courses in MEMS, for high school faculty and community
college faculty (for information, please contact mep@unm.edu).
A MEMS device, such as a pressure sensor, is produced
during these short courses.
Courses hosted by the MTTC Cleanroom
include,
Spring 2006
- UNM ECE-474/574 Microelectronics
Processing course (Prof. Hersee); created FET (15
students)
Summer 2006
- The UNM MTTC cleanroom hosted regional
High School faculty members (6) for a hands-on MEMS
training session, to create a MEMS pressure sensor,
from June 5 through June 9, 2006.
Fall 2006
- CNM MEMS-101 Intro to MEMS course
(Instructor: Fabian Lopez), practiced BOE etches on
SiO2-coated wafers (7 NM students)
Spring 2007
- CNM MEMS-101 Intro to MEMS
course (Instructor: Fabian Lopez), practiced BOE etches
on SiO2-coated wafers (12 CNM students)
- UNM ECE-474/574 Microelectronics
Processing course (Prof. Hersee); created FET (20
students)
- UNM ECE-595 MEMS, Transducers,
Devices and Technology (Prof. Chen); created pressure
sensor, and drug delivery probe prototype (9 students)
Summer 2007
- The MTTC Cleanroom hosted a week-long
MEMS workshop for local high school faculty members,
wherein they created a wafer of pressure sensors (4
faculty from Bernalillo High School, June
2007).
- CNM MEMS-101 Intro to MEMS course
(Instructor: Fabian Lopez); created art wafers, practiced
cleanroom protocols and safety, learned photolithography,
BOE etch, and piranha strip techniques. (9 students)
- CNM MEMS-220 MEMS Fabrication
Techniques course (Instructor: Fabian Lopez); created
pressure sensor arrays, practiced cleanroom protocols
and safety, learned photolithography, plasma dry-etch,
metalization for the "lift-off" process,
KOH bulk etch of silicon, electrical testing, and
piranha strip techniques. (7 students)
Fall 2007
- UNM ME-461E/561E, ECE-519 and NSMS-519
ST Theory, Fabrication, and Characterization of Nano/Microelectromechanical
Systems (NEMS/MEMS) course (Prof. Leseman); created
MEMS pressure sensors and MEMS actuators (27 students)
- The MTTC Cleanroom hosted a week-long
MEMS workshop for high school faculty members from
Santa Fe and Vermont, and university faculty members
from Iowa, Texas and Mexico, wherein they created
a wafer of pressure sensors (12-16 November 2007)
- CNM MEMS-101 (Sec. 101) Intro to
MEMS course (Instructor: Fabian Lopez), practiced
BOE etches on SiO2-coated wafers (9 CNM students)
- CNM MEMS-101 (Sec. 102) Intro to
MEMS course (Instructor: Fabian Lopez), practiced
BOE etches on SiO2-coated wafers (5 CNM students)
- CNM MT-2097 (Sec. 102) offered as
substitute for MEMS-220; created pressure sensor arrays,
practiced cleanroom protocols and safety, learned
photolithography, plasma dry-etch, metalization for
the "lift-off" process, KOH bulk etch of
silicon, electrical testing, and piranha strip techniques.
(5 students)
Spring 2008
- UNM ECE-474/574
Microelectronics Processing course (Prof. Hersee);
created FET (16 students)
- CNM SMT-2001 sec 101 Semiconductor
Fabrication course (Instructor: Fabian Lopez), fabricated
functional NMOS transistors, BOE etches of SiO2-coated
wafers, Aluminium deposition and etching of wafers,
electrical testing (5 CNM students)
- Southwest
Indian Polytechnical Institute (SIPI), Manufacturing
Technology course (Instructors: Nader Vadiee and Manuel
Maese); Native American students created "art"
wafer during one 4 hour lab session at MTTC cleanroom
(8 students)
Tours hosted by the MTTC Cleanroom
include:
- Albuquerque High School (CNM Instructor
Fabian Lopez; AHS Instructor Olga Vasquez; 28 HS students)
- Santa Fe Indian School (CNM Instructor
Fabian Lopez; SFIS Instructor Smokey Trujillo; 35
HS students)
- CNM ENGR-101 (CNM Instructor Dr.
Matt Pleil; 20 CC students)
- Santa Fe Indian School (SFIS Instructor
Smokey Trujillo; 11 HS students, 4/30/08, watched
wafer processing)
- Small Times (May/June 2007): “Community
Colleges are Critical”, by Staff, Vol. 7, No.
3, pg. 28.
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